MODEL 2010/M PRISM COUPLER FEATURES AND SPECIFICATIONSMeasurement accuracy and resolution*:
index accuracy: .001
thickness accuracy: (0.5% + 50 )index resolution: .0005
thickness resolution: 0.3%*Precise accuracy and resolution values depend on film type, thickness range, and rotary table resolution. Figures above are worst case and typical of films in the 0.5-1.0 micron thickness range with low resolution rotary table. For many applications, index resolution can be improved up to ±.00005 by use of a high resolution rotary table, a no-cost option (see below). Index absolute accuracy is limited primarily by uncertainties in determining the angle and refractive index of the measuring prism. If the user is willing to perform a simple calibration procedure with each prism, absolute index accuracy of ±.0001-.0002 can be achieved. NIST, fused quartz, and other standards are available for index calibration.
Refractive index measuring range: With standard prisms, films and bulk materials with refractive index 3.35 and below are measurable.
Film types/thickness ranges measurable: The Model 2010/M can measure virtually any film type which is not metallic or very highly absorbing at the operating wavelength. Thickness and index of one or both films of dual film layers are measurable, provided the top film has higher refractive index. Thickness must exceed a minimum threshold which depends on film and substrate (or underlying film) index. Examples of thickness ranges measurable* for common single or upper film types at the standard (633 nm) operating wavelength (for other film types, interpolate between example films with closest index):
Film type/index Thickness and index measurement** Thickness only (assume index) Silicon dioxide (n=l.46) over Si 0.48-150 microns 0.20-0.48 microns Photoresist (n=l.63) over Si 0.42-150 microns 0.18-0.42 microns Photoresist (n=l.63) over Silicon dioxide* 0.70-150 microns 0.30-0.70 microns Polyimide (n=l.72) over Si 0.38-150 microns 0.15-0.38 microns Polyimide (n=l.72) over Silicon dioxide* 0.50-150 microns 0.16-0.50 microns Si oxynitride (n=l.80) over Si 0.35-150 microns 0.14-0.35 microns Si oxynitride (n=l.80) over Silicon dioxide* 0.45-150 microns 0.13-0.45 microns Si nitride (n=2.0) over Si 0.32-150 microns 0.12-0.32 microns Si nitride (n=2.0) over Silicon dioxide* 0.30-150 microns 0.15-0.30 microns *High-index films over substrates or underlying films of lower index other than silicon dioxide are sometimes measurable at thicknesses up to half as thin as the above limits. Optional shorter wavelengths are also available to extend the measuring range to thinner films. Please consult Metricon for details. **Maximum thickness for which simultaneous thickness/index measurement is possible is approximately 150 microns for all film types. However, using bulk index measurement (see below), accurate index-only measurements of samples as thick as 1 cm may be made.
Typical measurement time: 10-25 seconds with standard table, 15-75 seconds with high resolution table.
Index-only measurement of bulk materials/thick films: Materials must be transparent/or semi-transparent. Maximum index measurable with standard prisms is 3.35. Accuracy and resolution are same as for thin film measurement (see above). Flexible materials are easily measured. Typical measurement time is 5-20 seconds.
Operating wavelength: Low power (0.8 mw nominal) He-Ne laser (632.8 nm), CDRH Class II is standard, but the system can be used with virtually any CW laser in the 400-1700 nm wavelength range. Optional shorter wavelengths (405, 473, 532, 594 nm) for measurement of thinner films and near-IR (830, 980, 1064, 1310, 1550 nm) wavelengths for waveguide applications are popular options. Optional sources change CDRH safety class to IIIa or IIIb.
Substrate materials/sizes: Film measurements may be made on virtually any polished substrate material including silicon, GaAs, glass, quartz, sapphire, GGG, and lithium niobate and the sample can be virtually any size or shape. Films may be deposited on flexible substrates (for example thin polymers). The standard unit accepts samples up to a maximum of 8" (200 mm) square - contact Metricon for larger sample sizes.
Measurement area: While the film and measuring prism are in contact over an area roughly 8 mm square, film area actually measured is only 1 mm diameter.
Prism types: Five standard prism types are available for measurement of films in various index ranges. Prisms are easily interchangeable in approximately one minute to permit use of more than one prism type with a single system:
Prism type Index range Comments 200-P-1 <1.80 low wear, optimum for low index (<1.80) films. 200-P-2 1.70-2.45 optimum for high index (>2.10) films. Optional 200-P-2-60 prism increases index measuring range from 2.1-2.65. 200-P-3 <2.10 useful over a wide index range (1.4-2.1). 200-P-4 <2.02 low wear, useful over a wide index range (1.4-2.0). 200-P-6 up to 3.35 for silicon/high index materials (wavelengths >1100 nm only) Major prism types shown - six other prism types stocked for special applications
Rotary table step size: 3.0 or 1.5 minutes, keyboard selectable. Higher resolution tables (0.9/0.45 or 0.6/0.3 minutes) are also available as a no-charge option. Higher resolution tables are recommended when film thickness exceeds 5-7 microns or when improved index resolution and accuracy are required. In some applications, higher resolution tables will increase measurement time.
Major options: Options to permit measurement of waveguide loss and determination of index vs temperature (up to 150o C) are available.
PC requirements: Windows 98, 2000, XP with 64 MB RAM and minimum processor speed of 366 MHz. Serial (COM1) port must be available and cannot be accessed by other applications.
The above specifications apply to the Model 2010/M when the system is operated in the standard prism coupling mode for measurement of thickness and index of thin films, or refractive index of bulk materials. For specifications when used in the optional VAMFO mode for non-contact measurement of film thickness only, please ask for information on VAMFO option #2010/M-VO.
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